Direct from our Tianjin manufacturing facility — precision CNC-machined, flame-worked, and polished quartzware engineered to rigorous cleanroom specifications.
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View Product SpecsA critical component in integrated photonic systems, high-speed fiber transceivers, and optical MEMS, the D-shaped quartz substrate bridges the gap between planar lithography and cylindrical optical waveguiding.
Unlike standard circular fused silica wafers or rectangular chips, a D-Shape quartz substrate features a high-precision chord cut across its circumference. This flat facet functions as an unambiguous mechanical datum plane, enabling micro-robotic pick-and-place equipment to maintain rotational alignment within ±0.05°. In high-density fiber pigtailed arrays and laser collimators, this eliminates rotational phase drift.
By planarizing the curved contour into a strictly controlled D-flat profile, the optical core can be positioned micro-fractions of a millimeter from the polished flat face. This creates an ideal architecture for evanescent wave interaction, allowing side-polished fiber sensors, D-shaped fiber bragg gratings (FBG), and surface plasmon resonance (SPR) bio-photonic chips to achieve quantum coupling efficiency without light dispersion.
Both the broad polished faces and the orthogonal D-cut reference flat undergo continuous planetary chemical-mechanical polishing (CMP). We achieve an average surface roughness of Ra < 0.3 nm, surface figure accuracy up to λ/10 @ 632.8 nm, and strict scratch-dig specifications down to MIL-PRF-13830B 10-5, preventing scattering losses in high-fluence UV and NIR laser transmissions.
Selecting the right synthetic fused silica or high-purity fused quartz grade is paramount to eliminate absorption bands, thermal birefringence, and laser-induced optical damage.
| Material Designation | Transmission Bandwidth | Hydroxyl (OH) Content | Bubble / Inclusion Class | Thermal Expansion (CTE) | Key Optoelectronic Applications |
|---|---|---|---|---|---|
| JGS1 (Synthetic UV Grade Fused Silica) | 185 nm – 2,500 nm | < 20 ppm (Ultra-Low) or > 1200 ppm (UV optimized) | Class 0 (DIN 58927, zero micro-bubbles) | 0.54 × 10⁻⁶ / K (0 to 200°C) | Excimer laser optics, DUV lithography alignment wafers, telecom transceivers (C-band/L-band). |
| JGS2 (Optical Grade Fused Quartz) | 220 nm – 2,500 nm | ~ 150 – 200 ppm | Class 1 / Class 2 | 0.55 × 10⁻⁶ / K | Broadband optical windows, spectroscopy viewports, fiber optic coupler carriers. |
| JGS3 (Infrared Grade Fused Quartz) | 260 nm – 3,500 nm (No OH peak at 2.73μm) | < 5 ppm (Water-free) | Class 0 / Class 1 | 0.55 × 10⁻⁶ / K | MWIR thermal imaging windows, mid-infrared fiber laser substrates, CO₂ laser beam combiners. |
| Synthetic Corning HPFS / Suprasil Equiv. | 190 nm – 2,100 nm | Strictly controlled ppm | Zero inclusions @ > 0.1 mm | 0.52 × 10⁻⁶ / K | Quantum optics chips, space-grade sensor substrates, interferometer reference standards. |
Withstands rapid thermal cycling up to 1100°C with zero structural warping or micro-delamination in high-power furnace processes.
Dielectric constant ε = 3.75 @ 10 GHz, ensuring ultra-low RF insertion loss in high-frequency optoelectronic RF packaging.
Certified laser-induced damage threshold verified at 1064 nm and 355 nm nanosecond/picosecond pulse regimes.
Impervious to organic solvents, aqua regia, and piranha clean solutions essential for semiconductor cleanroom wet etching.
Every D-shape substrate undergoes rigorous multi-stage fabrication, from diamond wire slicing of synthetic quartz ingots to multi-axis ultrasonic CNC grinding and laser interferometric certification.
Raw synthetic quartz ingots undergo precision CNC multi-wire diamond slicing. Slices are subjected to thermal stress relief in computerized annealing ovens at 1150°C with controlled ramps of < 1.5°C/min, eliminating internal stress birefringence below 5 nm/cm.
Our 5-axis ultrasonic CNC machining centers grind the D-shape chord edge to an accuracy of ±0.005 mm. Edge beveling (45° protective chamfers of 0.1 mm to 0.3 mm) is conducted with micro-grit diamond tools to guarantee complete freedom from subsurface micro-fissures and edge chipping.
Planetary double-sided polishing with nano-cerium slurry achieves Ra < 0.3 nm. 100% of production runs are verified with our Zygo Verifire phase-shifting laser interferometers for flatness (λ/10 to λ/20) and Taylor Hobson Form Talysurf for edge squareness within 90° ± 30 arcseconds.
Headquartered in Tianjin, China, BY Photonics has spent over 15 years mastering cold cutting, hot flame manipulation, and sub-micron optical polishing under one standardized ISO-certified roof.
Direct partnerships with high-purity synthetic quartz ingot refineries grant us bulk raw material reserves. This shields our global OEM partners from volatile raw ingot market price spikes and reduces supply lead times by up to 60% compared to Western optical brokers.
From slicing, CNC edge grinding, and double-sided polishing to cleanroom ultrasonic deionized water cleaning, ion-assisted electron-beam coating, and cleanroom vacuum packaging — no step is outsourced. Tolerance drift between multiple subcontractors is completely eliminated.
Our bilingual optical and mechanical engineering team reviews customer 2D and 3D CAD prints (STEP, IGES, DXF, DWG, PDF) within 24 hours. We evaluate geometric tolerances, facet perpendicularity, and chamfer transitions to ensure maximum yield at the lowest cost per unit.
Fulfilling the exacting regulatory, packaging, and logistics demands of tier-1 optical equipment manufacturers across North America, the European Union, Japan, South Korea, and Southeast Asia.
All synthetic fused silica and quartz materials are certified compliant with EU Directive 2011/65/EU (RoHS 2.0) and REACH (EC 1907/2006). Every shipment includes lot-specific material traceability certificates, full spectrometric transmission charts, and 3.1 Inspection Certificates.
Substrates undergo multi-stage ultrasonic cleaning using 18.2 MΩ·cm ultra-pure deionized water, followed by hot isopropyl alcohol (IPA) vapor drying. Parts are packed inside Class 100 laminar cleanrooms into customized antistatic fluoropolymer waffle packs, hermetically vacuum-sealed with desiccant.
We support standard international commerce terms including FOB, CIF, CFR, and full DDP (Delivered Duty Paid) door-to-door expedited air transit via DHL, FedEx, and UPS. Full customs clearance documentation is pre-cleared, ensuring seamless border transit without customs warehouse bottlenecks.
Engineered to excel in demanding environments requiring superior thermal shock resistance, unmatched dielectric isolation, and precision optical waveguiding.
In Co-Packaged Optics (CPO) and silicon photonic (SiPh) transceivers, space is at a premium. D-Shape quartz substrates serve as compact carrier blocks that hold optical fibers, laser diodes, and micro-lens arrays. The precision D-cut flat enables reliable automated indexing inside hermetic gold-tin (AuSn) soldered micro-packages.
Fiber laser output terminations demand extreme damage thresholds. High-purity JGS1 D-shaped substrates and end-caps eliminate internal thermal lensing under kilowatt-level continuous wave (CW) laser loads, allowing efficient beam expansion while preventing catastrophic end-face thermal runaway.
Medical dermatological equipment relies on robust triple-bore flow tubes, distance gauge sliders, and customized D-cut quartz reflectors. These substrates filter hazardous stray UV wavelengths, preserve coolant channel geometry, and withstand millions of xenon flashlamp pulses.
In DUV lithography steppers and wafer metrology stages, thermal expansion cannot exceed parts-per-billion tolerances. D-shaped quartz plates provide non-distorting reference markers, sensor carriers, and beam-splitter substrates that operate stably under continuous 193 nm and 248 nm exposure.
The flat polished facet of D-shape substrates allows high-resolution micro-channel etching via wet HF or reactive ion etching (RIE). Combined with thin-film gold coatings, it supports real-time DNA sequencing, protein detection, and pharmaceutical surface plasmon resonance (SPR) diagnostics.
For non-linear crystal waveguiding and integrated quantum photonics, JGS1 D-shape substrates offer ultra-low autofluorescence, high damage thresholds, and ultra-flat surface parallelism down to < 3 arcseconds, maintaining optical phase fidelity.
As artificial intelligence clusters, hyper-scale cloud data centers, and advanced quantum computing accelerate, the technical demands on precision optical substrates are evolving dramatically.
The ongoing migration from pluggable optical transceivers to on-board optics (OBO) and co-packaged optics (CPO) requires D-cut quartz substrates to shrink down to sub-millimeter footprints (dimensions < 1.5 mm × 1.0 mm × 0.3 mm) while maintaining mechanical tolerances of ±0.002 mm.
Rather than assembling separate V-groove arrays onto substrate flats, upcoming designs incorporate direct sub-micron micro-machined and laser-etched fiber guiding grooves directly onto the D-shape substrate, minimizing optical interface insertion losses below 0.1 dB per junction.
Next-generation defense and aerospace optics combine the ultra-low CTE and UV transmission of JGS1 fused silica with the superior Mohs 9 scratch hardness and mechanical strength of monocrystalline sapphire via plasma-activated direct bonding without optical epoxy.
Clear, direct answers to common questions raised by optical systems engineers, procurement specialists, and quality control directors.
Discover our comprehensive portfolio of borosilicate windows, doped flow tubes, ceramic reflectors, and precision quartz capillary tubes.
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View Product SpecsSend your CAD files (STEP, IGES, DXF, DWG or dimensioned PDF) directly to our technical processing desk. Our chief application engineers will return a complete Design for Manufacturability (DFM) assessment, material grade recommendation, and official quote within 24 business hours.