Engineered to extreme dimensional accuracy for semiconductor wafer handling, fiber optic coupling, and advanced laser systems.
A comprehensive examination of thermo-mechanical stability, precision micro-milling geometry, and optical transmission parameters.
U-Shape quartz substrates utilize synthetic fused silica (JGS1) and high-purity natural fused quartz (JGS2/JGS3) with silica content surpassing 99.999% (5N grade). This prevents contamination in microfluidic channels and avoids interstitial bubble formation during prolonged ultraviolet and deep-UV exposure.
Fabricating the internal channel of a U-shape geometry requires dedicated diamond ultrasonic tooling. We achieve slot width and bottom radius tolerances within ±0.005 mm, with Ra values down to 0.2 nm on polished optical walls to minimize light scattering and fluid friction.
With an extremely low coefficient of thermal expansion (5.5 × 10⁻⁷ /°C), our U-shape substrates maintain absolute geometric fidelity under thermal cycles from cryogenic conditions up to 1,150°C continuous service, preventing channel warping or optical misalignment.
| Performance Attribute | JGS1 (UV Synthetic Fused Silica) | JGS2 (Optical Fused Quartz) | JGS3 (Infrared Fused Quartz) |
|---|---|---|---|
| Transmission Range | 185 nm – 2,500 nm (Deep UV to NIR) | 220 nm – 2,500 nm (UV-Vis) | 260 nm – 3,500 nm (NIR to Mid-IR) |
| Hydroxyl (OH⁻) Content | < 2 ppm (Standard) or High OH Available | < 30 ppm | < 5 ppm (Zero Water Peak) |
| Channel Width Tolerance | ±0.003 mm to ±0.01 mm | ±0.005 mm to ±0.015 mm | ±0.005 mm to ±0.02 mm |
| Surface Roughness (Channel Ra) | < 0.4 nm (Flame / Chemical Polish) | < 0.8 nm (Diamond Micro-Lapping) | < 1.0 nm (Precision Ultrasonic CNC) |
| Refractive Index (nd @ 589.3 nm) | 1.4585 | 1.4584 | 1.4584 |
| Continuous Heat Resistance | 1,100 °C (Annealing pt: 1,140 °C) | 1,150 °C (Softening pt: 1,680 °C) | 1,150 °C (Softening pt: 1,680 °C) |
Bridging Chinese precision fabrication with European, North American, and Asian-Pacific regulatory frameworks and engineering requirements.
Full material documentation and third-party laboratory verification (SGS/TÜV) ensuring 100% heavy-metal-free and halogenous-compliant raw quartz blanks.
Our Tianjin engineering team works directly in STEP, IGES, DWG, and PDF formats, delivering localized Design-for-Manufacturability feedback within 24 hours.
Packed under Class 1,000 / Class 10,000 cleanroom environments using static-shielded, lint-free vacuum blisters to eliminate transit particulates.
Flexible procurement arrangements including Kanban scheduling, safety stock buffering, and door-to-door express customs clearance worldwide.
Combining primary quartz ingot drawing, cold CNC precision machining, and hot oxyhydrogen flame processing under one certified roof in Tianjin.
Unlike trading distributors, BY Photonics runs ingot cutting, grinding, slot micro-milling, flame welding, optical polishing, and Zygo laser interferometric inspection without third-party hand-offs.
Direct sourcing of domestic raw quartz blocks and advanced automated multi-axis grinding benches ensures a 30% to 50% cost advantage compared to Western boutique optics fabricators.
Full agility to manufacture quick-turn pilot runs (1-10 pieces) for academic and photonics R&D, followed by stable high-volume monthly supply for Tier-1 equipment manufacturers.
Strategic movements driving the rapid adoption of custom-grooved quartz substrates across high-reliability systems.
With co-packaged optics (CPO) and silicon photonics gaining rapid momentum in hyperscale AI data centers, U-groove and arrayed quartz substrates provide crucial non-conductive, low-loss optical fiber alignment platforms capable of sub-micron pitch consistency.
International OEMs are mitigating geopolitical bottlenecks by diversifying away from single-source domestic vendors. Our factory functions as a vetted, ISO-governed direct manufacturing partner with robust dual-sourcing pipelines for critical quartzware.
Life-science sequencing devices demand seamless monolithic glass designs that avoid polymer adhesives. U-channel quartz substrates sealed with fusion bonding provide pristine, chemically inert liquid avenues resistant to high-pressure enzymatic lysis.
Where precision-grooved U-shape quartz substrates function as vital structural and optical elements.
Serving as passive V-groove and U-groove alignment fixtures for planar lightwave circuits (PLC), multi-channel fiber arrays, and collimator fixtures demanding near-zero thermal drift.
Ideal for fluorescence spectroscopy detection cells, capillary electrophoresis, and micro-reaction flow cells requiring broadband UV transparency down to 190 nm.
Employed as thermal standoff substrates, vacuum feedthrough windows, and ion beam inspection stages where electrical insulation and chemical inertness are non-negotiable.
Utilized as fluid cooling channels and beam dump holders in solid-state and diode laser heads where ordinary borosilicate glass fractures under localized thermal lensing.
Comprehensive technical guidance for procurement officers, optical designers, and mechanical engineers.
Explore our complete manufacturing spectrum covering doped laser glass, ceramic reflectors, and precision quartz capillaries.