Double-sided polished solutions engineered with optical parallelism down to <5 arcseconds, ultra-low bubble classification, and chemical-mechanical planarization (CMP).
Advanced analysis of chemical, physical, and geometric tolerances demanded by high-volume global procurement departments in semiconductor lithography, advanced packaging, and laser optics.
Modern microelectronics leverage Double-Sided Polished (DSP) fused silica substrates for Glass Core Substrates (GCS) and Through-Glass Via (TGV) interposers. Eliminating surface micro-fractures through simultaneous chemical-mechanical dual-face lapping is essential to maintain structural stability during high-frequency laser drilling.
Solid-state lasers in medical and industrial cutting applications demand high-energy survivability. Double-sided polishing mitigates subsurface damage (SSD), removing subsurface micro-cracks that absorb localized photon energy. This guarantees high laser power survival under multi-gigawatt pulsed conditions.
Spectrophotometry, flow cytometry, and precision interferometry rely on JGS1 synthetic fused silica double-polished plates. Achieving high optical transmission down to 185 nm without birefringence distortions requires controlled stress relief, vacuum annealing, and precision dual-sided planetary polishing.
Rigorous engineering benchmarks across material selection, dimensional control, and post-polishing metrology verified by laser interferometry and atomic force microscopy (AFM).
| Metrological Metric | Commercial Wholesale Grade | High-Precision Semiconductor Grade | Ultra-Precision Optical/Laser Grade |
|---|---|---|---|
| Roughness (Ra / Sq) | Ra < 1.0 nm | Ra < 0.5 nm (AFM 10×10 μm) | Ra < 0.2 nm (Sub-Angstrom Super-Polished) |
| Total Thickness Variation (TTV) | < 5.0 μm | < 2.0 μm | < 0.5 μm (Parallelism < 3 arcsec) |
| Transmitted Wavefront Error (TWE) | λ/2 per inch @ 632.8 nm | λ/4 per inch @ 632.8 nm | λ/10 to λ/20 peak-to-valley across clear aperture |
| Surface Quality (MIL-PRF-13830B) | 60/40 Scratch-Dig | 40/20 Scratch-Dig | 10/5 to 20/10 Scratch-Dig (Zero pit defect) |
| Material Matrix Suitability | Natural Quartz / JGS2 | Synthetic Fused Silica (JGS1) | Low-OH Fused Silica / Corning 7980 / Suprasil |
| Inspection Verification | Mechanical Micrometer / Visual | Non-contact Capacitive / Optical CMM | Zygo VeriFire Laser Interferometer / AFM |
From cleanroom thermal processes to aerospace electro-optics, BY Photonics delivers integrated supply chain resilience directly from manufacturing hubs.
By operating raw material ingot conversion, multi-wire saw slicing, CNC core machining, and planetary double-sided lapping under one roof in Tianjin, tier-1 wholesale buyers bypass broker markups while securing transparent batch lot traceability.
DSP quartz components operate continuously at temperatures up to 1,100 °C with minimal coefficient of thermal expansion (5.5 × 10⁻⁷ /°C). Essential for wafer carriers, vacuum viewports, and reactive ion etching (RIE) chamber shields.
Factory-level chemical washing uses ultra-pure deionized water baths (>18.2 MΩ·cm) and automated ultrasonic megasonic transducers, eliminating metal ion residue (Fe, Cu, Ni, Na below 0.1 ppm) prior to class 100 cleanroom packaging.
Wholesale direct factory supply for OEM integration, research institutions, and precision wafer fab maintenance.
Full compliance testing and export verification guarantee seamless integration into Western, Asian, and European manufacturing lines.
Every double-sided polished lot is serialized and certified under strict ISO 9001:2015 frameworks. Surface particulates are monitored under Class 100 cleanroom environments conforming to ISO 14644-1 parameters.
Materials undergo routine hazardous substance mass spectrometry assays to verify full compliance with EU RoHS 3 and REACH regulations. Material origins are fully traceable to conflict-free source minerals.
Technical support desks located in Tianjin coordinate seamlessly across time zones with North American and European engineers, returning full Design For Manufacturability (DFM) analyses within 24 business hours.
Detailed insights regarding double-sided polishing parameters, material selection, and fabrication lead times.
Double-Sided Polishing processes both faces of the quartz wafer or window simultaneously between counter-rotating carriers and planetary plates. This removes differential stress, preventing the component from bowing or warping after release. Furthermore, DSP achieves total thickness variation (TTV) <1 μm and parallelism <3 arcseconds, tolerances unachievable through standard single-side mounting wax methods.
All three varieties possess an identical low thermal expansion coefficient (~5.5 × 10⁻⁷ /°C) and can withstand operating environments up to 1,100 °C continuously. However, JGS1 is synthesized with synthetic SiCl₄ precursors yielding pure SiO₂ without metallic trace elements, ensuring zero bubble inclusions and high deep-UV transmission down to 185 nm. JGS3 features extremely low hydroxyl (<10 ppm OH) content, eliminating the 2.73 μm absorption band for mid-infrared transmission up to 3,500 nm.
Yes. We employ multi-axis ultrasonic CNC grinding along with chemical acid etching (HF buffer dips) to polish core-drilled holes, stepped rebates, and peripheral 45° or R-type edge roundings. This specialized post-grinding polish eliminates edge micro-cracks that initiate thermal fractures during high-heat diffusion cycles.
Shipments are accompanied by a comprehensive Quality Inspection Dossier containing: Zygo 3D interferometric surface wavefront maps, non-contact optical profilometer reports for Ra roughness, spectrographic transmission data curves from 185 nm to 3,500 nm, and formal Certificates of Conformance (CoC) verifying dimensional and angular parallelism tolerances.