Precision-machined optical glasses, fused silica substrates, and high-transmission components with custom anti-reflective vacuum deposition.








Achieving sub-0.1% residual reflectance with high laser-induced damage thresholds (LIDT) across deep UV, visible, and far-infrared spectral corridors.
Utilizing direct plasma source momentum transfer to eliminate column-void architectures in evaporated dielectric oxides (SiO2, TiO2, Ta2O5). Eliminates spectral shift caused by atmospheric water vapor absorption in medical and outdoor laser environments.
Closed-field dual magnetron sputtering provides atomic thickness uniformity (variation < 0.3% over 300mm platen diameters). Essential for high-index contrast quarter-wave stacks demanding stringent optical density without internal stress cracking.
Engineered thermal dissipation and electric-field distribution profiling. Our AR thin films withstand > 15 J/cm² @ 1064nm (20ns pulse, 20Hz), preventing nodular defect blowout in high-energy industrial cutting and semiconductor wafer lithography systems.
| Coating Specification | Narrowband V-Coat (AR-V) | Broadband Anti-Reflective (BBAR) | Dual-Band Harmonic (DBAR) | Mid-to-Far IR Coating |
|---|---|---|---|---|
| Target Wavelengths | 532nm, 1064nm, or 1550nm | 400–700nm / 700–1100nm | 532nm & 1064nm | 2.0µm – 14.0µm |
| Residual Reflectance (R) | R < 0.10% at design λ | R_avg < 0.40% across band | R < 0.25% at both λ | R_avg < 0.8% in transmission window |
| Typical Substrate Material | JGS1 UV Fused Silica | Optical Glass (BK7/B270) | Fused Quartz / Sapphire | ZnSe, Silicon, Germanium |
| Laser Damage Threshold | > 20 J/cm² (1064nm, 20ns) | > 5 J/cm² (532nm, 10ns) | > 10 J/cm² (dual pulsed) | > 2 J/cm² CW / pulsed equivalent |
| Environmental Durability | MIL-C-675C / MIL-PRF-13830B | ISO 9211-4 Abrasion & Humidity | Severe abrasion qualified | Salt fog & high-humidity certified |
Complete vertical consolidation from domestic synthetic silica ingot growth to computerized ultrasonic multi-stage cleaning and automated vacuum deposition.
Direct access to first-tier high-purity JGS1, JGS2, and JGS3 quartz boules eliminates overseas raw material bottlenecks. We preserve unbroken chain of custody with full melt certificates.
Co-locating 5-axis CNC grinding, planetary double-side chemical-mechanical polishing (CMP), and oxyhydrogen flame tube forming directly beside high-vacuum chambers eliminates transit contamination.
High unit batch density, custom jig fabrication in-house, and domestic planetary coating chamber tooling drastically decrease per-unit tooling costs without yielding on surface roughness (Ra < 0.5nm).
Rapid 5-day cycle time for prototype witness samples followed by scalable 100,000+ pcs/month batch ramp capacity, serving tier-1 worldwide OEMs with reliable Kanban and buffer stocks.
Mitigating supply-chain compliance risk with rigorous testing documentation, spectral batch certificates, and universal regulatory alignment.
All substrate pre-cleaning, masking, loading, and spectrophotometric metrology happen inside Class 1,000 / Class 100 laminar cleanroom zones to prevent particulate shadowing defects.
Fully green evaporant and target raw materials. 100% compliant with EU RoHS Directives (2011/65/EU and 2015/863) and REACH SVHC evaluations without carcinogenic heavy metals or halogen residues.
Every shipment includes spectrophotometer transmission/reflection curves (PerkinElmer Lambda 1050+), Zygo GPI phase-shifting interferometry reports, and environmental adhesion test data.
From cleanroom lithography suites to rugged aerospace sensors, tailored anti-reflection layers optimize transmission efficiency.
DUV anti-reflective coatings on high-purity JGS1 quartz windows for excimer lasers (193nm, 248nm) delivering low wavefront aberration and chemical resist vapor resistance.
Ultra-low fluorescence quartz flow cells and cuvettes with hydrophobic BBAR coatings, eliminating internal stray scattering and increasing signal-to-noise ratio in DNA sequencing.
Flow tubes, samarium-doped filter jackets, and collimator lenses coated for 1064nm & 1070nm fiber/solid-state lasers with guaranteed zero-ghosting reflection back-burn defense.
Extreme-temperature sapphire optical plates with broad-band AR coatings designed to endure supersonic aerodynamic heating, sand abrasion, and high moisture cycling.
Tracking the next decade of anti-reflective advancements: moving from standard dielectric layer interference to bio-inspired nanostructured metasurfaces.
Direct reactive-ion etching (RIE) of random or periodic sub-wavelength cones on fused silica. Achieves zero coating stress, eliminates material thermal mismatches, and pushes damage thresholds beyond 50 J/cm².
Expanding coating capability beyond flat windows. ALD enables atomic 100% conformal AR layers inside 3D high-aspect ratio quartz capillaries, multi-bore flow cells, and complex micro-grooved substrates.
Integrating self-cleaning oleophobic and super-hydrophobic functional top layers atop multi-layer dielectric AR stacks without compromising broadband optical transmittance in harsh industrial field cameras.
Critical engineering criteria for OEM sourcing managers and optical designers seeking custom anti-reflective coatings.
High-reliability optical windows, capillary systems, and laser cavities ready for precision vacuum optical coatings.







