Which glass and crystal materials can BY Photonics machine?

We machine JGS1 UV fused silica, JGS2 and JGS3 fused quartz, borosilicate glass, optical glass, optical color filter glass, infrared glass, samarium- and cerium-doped glass, sapphire, PTFE-based diffuse reflector material and laser ceramics.

What is the difference between JGS1, JGS2 and JGS3 quartz glass?

JGS1 is synthetic UV-grade fused silica with high transmission from about 185 nm. JGS2 is fused quartz for the visible range with good UV transmission from about 220 nm. JGS3 is infrared-grade fused quartz with low OH content that transmits up to about 3,500 nm.

Which drawing formats should I send for a custom part?

STEP, IGES, DWG, DXF or a dimensioned PDF are all accepted. Please include material, quantity, critical tolerances, surface quality, coating and the operating environment of the part.

How quickly will I receive engineering feedback?

Our engineers review complete drawings and return a manufacturability assessment within 24 hours on working days.

Do you support prototypes and export shipping?

Yes. We support prototype and low-volume orders as well as repeat batch production, and our components are shipped to customers worldwide.

Custom High Purity Fused Quartz Plates Suppliers & Factory

Featured Inventory

Primary Optical & Semiconductor Components

Explore our primary batch of precision-machined fused silica plates, specialized laser cavities, and quartz capillary substrates calibrated for extreme thermal, chemical, and optical environments.

High-Quality JGS1 UItraviolet (UV) Grade Fused Silica Plate

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Wholesale Diffuse High‑Reflectivity PTFE Reflectors for Diode‑Pumping Chambers

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High-Quality Customized Quartz Fiber End Caps for QBH

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High-Quality Custom Precision Quartz Glass Fabrication

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High-Quality Custom Precision Quartz Capillary Tubes

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High-Quality Ceramic Cavities For Nd YAG Laser

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Custom Sapphire IPL Light Guide Block Used for Laser IPL Hair Removal

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Custom Borofloat 33® Glass Wafers for Semiconductor

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Market Insights

Evolution & Technological Trajectory of Fused Quartz Plates

In advanced high-power laser optics, semiconductor lithography, and photovoltaic manufacturing, standard silicate glass fails rapidly under thermal shock, chemical etching, and deep-ultraviolet (DUV) photodarkening. High-purity fused quartz (amorphous silicon dioxide, SiO₂) plates have evolved from simple furnace sight-glasses into high-precision, mission-critical substrates.

99.999%

SiO₂ Purity (5N5 Grade)

5.5×10⁻⁷

CTE (/°C, 20°C - 320°C)

< 1 ppm

Trace Metal Contamination

> 92%

Transmission at 185-2500nm

Transition to Synthetic Precursors (SiCl₄)

Traditional electric-arc or gas-fusion techniques utilizing natural quartz sands carry irreducible levels of aluminum, iron, and titanium impurities. The modern industry is accelerating toward CVD vapor-phase synthetic fused silica (such as JGS1), yielding hydroxyl (OH) optimized materials immune to UV-induced color centers and laser-induced fluorescence.

Atomic-Scale Surface Planarization

Next-generation DUV/EUV photomask blanks and wafer bonding substrates demand sub-nanometer surface roughness (Ra < 0.2 nm). Advanced Double-Sided Lapping and Chemical Mechanical Polishing (CMP) now guarantee surface flatness tolerances exceeding λ/10, paired with zero surface subsurface micro-fracturing.

Extreme Thermal Gradient Resilience

With an ultra-low thermal expansion coefficient of 5.5 × 10⁻⁷ /°C, precision quartz plates survive thermal shock differentials exceeding 1000°C without crack propagation. This thermomechanical stability makes them the standard window material for rapid thermal annealing (RTA) and plasma etching.

Procurement Drivers

Global Sourcing Requirements & Supply Chain Shifts

Tier-1 industrial buyers face stringent procurement requirements. Inconsistency in bubble classes, striations, or minor trace metal variations directly correlates to dropped wafer yields or catastrophic optical breakdown in high-power laser cavity systems.

Strict Bubble & Inclusion Standards

Compliance with DIN ISO 10110-3 is critical. Optics designed for 1064nm, 532nm, and 355nm lasers require Class 0 bubble ratings to eliminate scattering sites that initiate Laser-Induced Damage Threshold (LIDT) degradation.

Stress Birefringence Mapping

Optical polarization components and lithography steppers demand minimal residual internal stress. High-purity quartz plates must undergo controlled optical annealing, guaranteeing optical retardance under 5 nm/cm.

Lead Time Stability

Global semiconductor fab expansions have created acute quartz supply shortages. International engineering teams are moving away from legacy regional single-sources toward resilient, vertically integrated manufacturing partners.

DFM Engineering Support

Procurement teams demand rapid engineering validation. Dimensional drawings (STEP, DXF, PDF) require immediate Manufacturability (DFM) verification to eliminate stress concentrators and reduce fabrication cycle times.

Material Verification

Fused Silica & Quartz Material Engineering Matrix

Selecting the exact quartz grade prevents transmission loss, thermal deformation, and outgassing in high-vacuum chambers. Review standard operational parameters verified through our metrology laboratories.

Material Grade	Production Methodology	Transmission Bandwidth	OH Content (ppm)	Thermal Shock Max	Primary Industrial Use-Case
JGS1 (Synthetic Fused Silica)	Chemical Vapor Deposition (SiCl₄)	185 nm – 2,500 nm (DUV to NIR)	< 1200 ppm	1,150 °C	Laser Output Windows, DUV Optics, Lithography Masks
JGS2 (Fused Quartz)	Oxyhydrogen Flame Fusion (Purified Sand)	220 nm – 2,500 nm (UV to NIR)	< 200 ppm	1,100 °C	Chemical Sight Glass, Sensor Discs, Photovoltaic Substrates
JGS3 (Optical Infrared Quartz)	Electric Vacuum Fusion Method	260 nm – 3,500 nm (Extended IR)	< 5 ppm	1,100 °C	Pyrometers, FTIR Spectroscopy, High-Temp IR Chambers
Borofloat 33®	Micro-Float Glass Technology	350 nm – 2,500 nm (Visible / NIR)	N/A	450 °C	Semiconductor Wafer Carriers, MEMS Anodic Bonding
Optical Sapphire (Al₂O₃)	Kyropoulos Single-Crystal Growth	170 nm – 5,500 nm (DUV to Mid-IR)	Zero	1,800 °C	Extreme Wear Viewports, IPL Waveguides, Plasma Windows

Manufacturing Prowess

China Factory 4.0: Supply Chain Resilience & Direct OEM Value

Tianjin BY Photonics Co., Ltd. (operating continuously since 2010) brings together advanced hot flame working and precision cold fabrication inside a streamlined 3,000+ m² facility, bridging raw material processing and sub-nanometer optical finishing.

Integrated CNC Multi-Axis Glass Machining

Equipped with ultra-rigid 5-axis CNC ultrasonic-assisted glass machining centers, we fabricate stepped bores, precision perimeter bevels, multi-depth channels, and micron-accurate locating holes without sub-surface micro-cracking or edge spalling.

Cleanroom Oxyhydrogen Thermal Fusion

Our master glassblowers and automated lathe welders execute high-integrity joins for quartz wafer carriers, semiconductor diffusion boats, and custom quartz reaction vessels. All assemblies undergo post-fabrication annealing cycles to eliminate internal stress vectors.

Metrology & Clean Packing Protocols

Every custom fused quartz plate passes through Zygo laser interferometers (wavefront distortion testing), spectrophotometers (transmittance verification from 185nm to 3500nm), and optical coordinate measurement machines (CMM) before ultrasonic cleaning and cleanroom packaging.

Application Realities

Precision Realized: Key Industrial Application Scenarios

Explore how our custom fused quartz plates, windows, and substrates perform across mission-critical technical sectors globally.

High-Power Industrial Laser Systems

Debris shield windows, laser flow plates, and beam-splitter substrates engineered to survive peak power densities without photothermal lens distortion or ablation.

Semiconductor Fab & Metrology

Precision quartz diffusion boats, high-purity wafer carriers, and viewports for plasma etch (ICP/RIE) systems resistant to fluorinated chemistry attack.

Spectrophotometry & Diagnostics

Zero-fluorescence JGS1 optical cuvettes, flow cells, and microfluidic baseplates delivering maximum signal-to-noise ratio in UV-Vis and HPLC instrumentation.

Aesthetic Laser & Medical Photonics

Custom sapphire light guides and yellow-doped quartz tubes absorbing unwanted flash-lamp UV radiation, protecting patient skin and clinical equipment.

Engineering Advisory

Frequently Asked Technical Questions (FAQ)

Clear, definitive technical clarifications addressing optical parameters, tolerancing, and fabrication limits directly from our engineering team.

What are the mechanical and optical limits for custom fused quartz plate tolerances?

We machine custom fused quartz and fused silica plates to dimensional tolerances down to ±0.02 mm for planar dimensions and ±0.01 mm for thickness. For optical performance, our grinding and polishing line routinely hits surface flatness of λ/10 per inch @ 632.8 nm, parallelism < 10 arcseconds, and surface quality ratings of 20-10 scratch-dig according to MIL-PRF-13830B or ISO 10110.

How do I select between JGS1, JGS2, and JGS3 quartz grades for my drawing?

Selection depends on the working spectral wavelength and thermal profile. JGS1 is synthetic fused silica offering superior transmission from 185 nm to 2500 nm, completely free of bubbles and inclusions, making it essential for UV lasers and semiconductor imaging. JGS2 is flame-fused natural quartz performing reliably in visible and NIR wavelengths (220 nm – 2500 nm) for sight windows and heating vessels. JGS3 is electrically melted in vacuum, exhibiting almost zero hydroxyl content (OH < 5 ppm), which eliminates the 2.73 µm absorption band and guarantees superior performance in the infrared spectrum up to 3500 nm.

What is the Laser-Induced Damage Threshold (LIDT) for your fused silica windows?

For uncoated JGS1 synthetic UV-grade fused silica plates, our typical LIDT reaches > 10 J/cm² with a 10 ns pulse at 1064 nm. With our specialized super-polishing (Ra < 0.5 nm) and tailored dielectric anti-reflective (AR) coatings (single-wavelength, dual-band, or broadband), our plates support extreme multi-kilowatt CW lasers and pulsed industrial laser cutting heads without thermal blooming.

Can you execute complex CNC milling, such as blind holes, bevels, and micro-grooves?

Yes. BY Photonics houses multi-axis CNC ultrasonic-assisted glass machining centers explicitly engineered for hard and brittle optical substrates. We can interpolate countersinks, circular steps, laser-cut notches, o-ring grooves, and microfluidic capillary channels with edge chipping controlled to under 0.05 mm, completely eliminating localized micro-fractures.

What is your turnaround timeframe for custom DFM assessments and sample prototypes?

Upon receipt of complete technical drawings (accepted formats: STEP, IGES, DWG, DXF, or fully dimensioned PDF), our engineering review desk provides a complete Design for Manufacturability (DFM) assessment and formal quotation within 24 working hours. Prototype production typically completes in 7 to 14 days depending on custom coating and raw material geometry requirements.

Complete Assembly Lines

Advanced Industrial, Laser & Semiconductor Ware

Explore the second series of precision-crafted optical components, from semiconductor quartz diffusion boats and laser distance gauge sliders to sapphire viewports and fiber ferrules.