Custom Lenses Anti Reflective Coating Manufacturers & Suppliers

JGS1 is synthetic amorphous silicon dioxide made from pure chemical gas precursors ($SiCl_4$). It exhibits ultra-high chemical purity, no bubble or inclusion defects, and excellent transmission spanning the deep UV from 185nm up to 2500nm. It is the premier substrate for laser windows and DUV photolithography. JGS2 is refined natural fused quartz with good optical transparency from 220nm to 2500nm, typically specified for sight glasses and optical structural elements. JGS3 is manufactured to be virtually free of hydroxyl groups ($OH < 5\text{ ppm}$), removing the deep 2.73 µm OH-absorption band, which allows optical transmission extending outward to 3500nm in the infrared domain.

LIDT validation is carried out according to ISO 21254-1, 2, and 3 test protocols. We subject samples to single-shot (1-on-1) or repeated pulse trains (S-on-1, typically 1,000 to 10,000 shots) using calibrated laser sources (e.g., Nd:YAG 1064nm, 10ns pulse width, 20Hz repetition rate, or femtosecond titanium-sapphire lasers). Fluence ($J/cm^2$) is mapped against zero-probability damage thresholds under differential Nomarski microscopy. Real-time scatter diagnostics detect microscopic breakdown of the dielectric lattice before visible crater formation occurs.

Yes. Sapphire presents a high refractive index ($n \approx 1.76$ in visible), which causes Fresnel reflections of approximately 7.6% per surface (over 14.5% total transmission loss). Depositing multi-layer oxide stacks (such as $TiO_2$, $Ta_2O_5$, $HfO_2$, and $SiO_2$) via Ion-Assisted Deposition (IAD) allows custom sapphire plates, light guides, and viewports to drop reflectance below 0.25% per surface while matching sapphire's mechanical durability and thermal expansion coefficients.

Delamination occurs when intrinsic residual stress (tensile or compressive) combines with thermal stress from differences in Coefficient of Thermal Expansion (CTE) between the optical substrate and the thin-film layer stack. BY Photonics prevents coating failures by: 1) Thorough multi-stage ultrasonic cleaning and in-situ RF plasma glow-discharge substrate etching to eliminate molecular contaminants; 2) Fine-tuning oxygen partial pressures and ion-beam bombardment energies to balance compressive and tensile layers; and 3) Conducting controlled thermal vacuum annealing post-deposition to relax lattice stress.

To achieve uniform thickness across steep curves, aspheric lenses, and multi-faceted light guides, our vacuum coating chambers use planetary rotation fixtures designed specifically for each substrate geometry. Rotating parts simultaneously around chamber centerlines and component axes balances the physical vapor deposition plume angle. Furthermore, computer-modeled shadow masking plates attenuate flux towards high-velocity zones, delivering thickness uniformity across curved optical surfaces within $\pm 0.5\%$.

We accept standard 3D CAD files (STEP, IGES) and 2D engineering drawings (DWG, DXF, PDF). Your print should state: base material grade (e.g., JGS1, Corning 7980, Borofloat 33, Sapphire), key dimensions and tolerances (diameter, thickness, radius of curvature), surface figure / flatness (e.g., $\lambda/10$ @ 632.8nm), scratch-dig (e.g., 20-10), coating requirements (operating wavelength band, target reflectance, and AOI), and laser damage specifications if applicable.