Explore our precision quartz gas distribution plates, flow assemblies, and laser optical elements manufactured to stringent sub-micron tolerances for Tier-1 fabs and laser OEMs.
In modern semiconductor processing—specifically Atomic Layer Deposition (ALD), Plasma-Enhanced Chemical Vapor Deposition (PECVD), and reactive ion etching—the quartz showerhead (gas distribution plate) dictates thin-film uniformity, reactant residence time, and defect density.
Traditional mechanical drilling produces sub-surface micro-cracks that fracture under cyclic thermal shock. Next-gen quartz showerheads utilize femtosecond laser trepanning combined with chemical polishing, creating laminar gas flow holes from Ø0.2mm to Ø1.2mm with zero chipping and concentric wall roughness Ra < 0.2µm.
Halogen plasma gases (NF3, CF4, Cl2) rapidly etch standard quartz glass, leading to particle detachment and yield loss. Our engineered high-density synthetic fused silica plates feature ultra-low hydroxyl (OH < 1 ppm) and an amorphous structure that resists fluorine ion erosion up to 3.4× longer than regular fused quartz.
Even minor structural variances across a 300mm or 450mm showerhead introduce non-uniform gas velocities across the silicon substrate. By maintaining overall plate flatness below λ/4 and parallel tolerances within ±0.01mm, thermal expansion remains isotropic during 1,100°C thermal processing cycles.
Selecting the optimal quartz crystal matrix prevents metal contamination (Fe, Cu, Na) and ensures molecular structural stability inside high-vacuum deposition reactors.
| Property Parameter | JGS1 (Synthetic Fused Silica) | JGS2 (Electric Fused Quartz) | JGS3 (Low-OH Gas Refined) | Semiconductor Standard |
|---|---|---|---|---|
| Purity Level (SiO2) | > 99.9999% (6N) | > 99.995% (4.5N) | > 99.998% (5N) | SEMI C10 Certified |
| OH Content (Hydroxyl) | < 1,200 ppm (UV Stable) | < 150 ppm | < 5 ppm (Zero Bubbles) | Custom Calibrated |
| Total Trace Metals (Fe, Cu, Ni, Na) | < 0.1 ppm | < 1.5 ppm | < 0.8 ppm | < 0.5 ppm Total |
| Max Service Temp (Continuous) | 1,150 °C | 1,100 °C | 1,200 °C | 1,100 °C min |
| Thermal Shock Resistance | 1,100°C to 20°C Quench Pass | 1,000°C to 20°C Quench Pass | 1,150°C to 20°C Quench Pass | Delta T = 1,000°C |
| Primary Chamber Use Cases | EUV Lithography, ALD 5nm/3nm | PECVD, LPCVD, Diffusion Tubes | Epitaxy, Dry Etch, Rapid Thermal | Wafer Processing |
Combining vertically integrated raw boule synthesis, computerized 5-axis ultrasonic machining, and robotic oxyhydrogen fire-polishing to supply global wafer fabrication clusters.
Brittle quartz components fracture under mechanical stress. Our digital-twin CNC machining centers deploy 20kHz–40kHz ultrasonic micro-vibrations, reducing tool friction by 68% and enabling hole aspect ratios up to 15:1 without thermal cracks.
Every wholesale quartz showerhead passes complete coordinate measuring machine (CMM) inspections and laser interferometry. Hole positions, perpendicularity, orifice diameters, and pitch concentricity are documented with 100% data traceability.
Contamination control is paramount. Machined showerheads undergo ultrasonic deionized water cascade baths, ultra-pure hot nitrogen baking, and double vacuum sealed anti-static packaging inside certified ISO Class 5 (Class 100) cleanrooms.
With an operational base in Tianjin, China since 2010, our vertically integrated plant eliminates third-party markups and subcontractor delays. We sustain safety buffer stocks for long-term supply agreements with OEM semiconductor machine builders.
From leading fab tooling in East Asia and Europe to cutting-edge research institutes in North America, our quartz showerheads ensure process repeatability across high-precision environments.
ALD operates via alternating precursor exposures, where stagnant gas pockets produce film thickness variances. Our quartz showerheads incorporate aerodynamically chamfered micro-orifices that purge rapidly between precursor cycles, eliminating ghost deposition.
In high-density plasma (HDP) etching, standard metal diffusers contaminate wafers through ion sputtering. High-purity synthetic quartz showerheads offer electrical insulation, resist radical recombination, and drastically reduce micro-defect rates.
For large-scale silicon heterojunction (HJT) solar panels and OLED glass substrate encapsulation, large-format quartz plates (up to 800mm in diameter) maintain uniform silane/hydrogen gas distribution without sagging or micro-stress breakage.
Fabricated with strict compliance to cleanroom manufacturing workflows. Compatible with leading equipment platforms and customizable via engineering drawings.
Factual answers regarding DFM parameters, hole aspect ratios, thermal annealing cycles, and wholesale export specifications.
Using 5-axis ultrasonic CNC and femtosecond laser trepanning, we machine hole diameters down to 0.20mm (±0.005mm) with aspect ratios up to 15:1. Internal walls are chemically fire-polished to eliminate micro-burrs and micro-cracks that induce particle spallation.
Drilling thousands of micro-orifices in a single quartz disc induces localized internal hoop stress. Every showerhead plate undergoes an extended multi-stage annealing cycle up to 1,150°C in high-vacuum electric furnaces, verified via polariscope stress birefringence (< 5 nm/cm).
Yes. Over 85% of our wholesale production is custom-machined from customer STEP, IGES, or DXF drawings. Our engineering desk conducts a comprehensive Design for Manufacturability (DFM) review within 24 hours to optimize hole pitch, bevels, and O-ring sealing grooves.
Shipments can include ICP-MS material purity certificates, full coordinate measuring machine (CMM) dimensional verification sheets, surface profilometer scans (Ra), interferometer flatness plots, and cleanroom vacuum packaging compliance certificates.